| |
| Activities |
| Low Dimensional Quantum Structure
Lasers |
Staffs: Y. Suematsu S. Arai S. Tamura Post-Doctoral
Research Fellow: B. Chen N. Nunoya (from Oct.) Students: N.
Nunoya M. Morshed H. Yagi K. Muranushi K. Ohira A. Onomura T.
Sano
|
| |
| GaInAsP/InP strained-quantum-film, -wire and -box lasers have
been studied. Distributed feedback (DFB) lasers consisting of
wirelike active regions fabricated by the same fabrication process
as Quantum-Wire lasers have been also studied.
Results obtained in this research are as follows: |
| |
(1) 1.5-µm-wavelength partially strain-compensated
GaInAsP/InP 5-layered quantum-wire lasers with the wire width
of 23 nm in the period of 80 nm were realized for the first
time by electron beam lithography, CH4/H2-reactive
ion etching and organometallic vapor-phase-epitaxial regrowth.
The threshold current density of 774 A/cm2
and differential quantum efficiency of 40 % were obtained
under a pulsed condition at room temperature. From measurement
of spontaneous emission spectra, the blue shift at the peak
wavelength was 38 meV, which was much larger than a calculated
value, and the spontaneous emission spectral width was almost
constant at temperatures between 103 K and 253 K, indicating
a lateral quantum confinement effect. Finally, the spontaneous
emission efficiency below the threshold was almost comparable
to that of the Q-Film lasers up to 85°C, that revealed
low-damage property of the etched/regrown interfaces.
(2) GaInAsP/InP partially strain-compensated multiple-quantum-wire
lasers with the wire widths of 18 nm and 27 nm in the period
of 80 nm were also realized. Size fluctuations of these quantum-wire
structures were measured by scanning electron microscope views,
from which the standard deviation was obtained to be less
than 2 nm. The differential quantum efficiencies of these
quantum-wire lasers were almost the same as that of the 5-quantum-well
lasers at room temperature. From EL spectra of various wire
widths lasers, a larger energy blue shift than that from a
simple analysis model was observed, which can be attributed
to residual compressive strain between the active region and
surrounding InP layer.
(3) High-performance operation of 1.55 µm wavelength
GaInAsP/InP strongly index-coupled and gain-matched distributed
feedback lasers with periodic wirelike active regions was
realized, whose index-coupling coefficient was more than 300
cm-1. In order to design lasers
for low threshold current operation, threshold current dependences
on the number of quantum wells and the wire width were investigated
both theoretically and experimentally. A record low threshold
current of 0.7 mA was realized at room temperature CW condition
for a 2.3-µm-wide buried heterostructure with a 200-µm-long
cavity. We also confirmed stable single-mode operation due
to a gain matching effect between the standing-wave profile
and the wirelike active region.
(4) A CW life test of 1550 nm gain-matched DFB laser, which
consists of wire-like active regions and exhibits sub-mA threshold,
was carried out. No degradation was observed in the output
and the spectral characteristics after 8500 hrs operation
at a bias current around 10 times the threshold.
(5) A distributed reflector (DR) laser consisting of wirelike
active regions with asymmetric output characteristic was realized
for the first time. To realize an asymmetric output property
while maintaining low threshold current operation, a l/4
shifted grating and modulated active region widths were introduced
into the grating structure. Threshold current as low as 1.8
mA, asymmetric output ratio of 8, and a sub-mode suppression-ratio
(SMSR) of 33 dB at I = 1.2Ith
were obtained for the cavity length of 200 µm and the
stripe width of 2.3 µm under a RT-CW condition. |
| |
| New Types of Semiconductor
Lasers for Photonic Integration |
Staffs: Y. Suematsu S. Arai Y. Miyamoto S. Tamura
Post-Doctoral Research Fellow: B. Chen N. Nunoya (from
Oct.) Students: J. Wiedmann N. Nunoya H.-C. Kim K.
Ebihara K. Matsui T. Okamoto M. Ohta Y. Onodera H. Kanjo |
| |
| Semiconductor lasers with low threshold current, high efficiency,
and single wavelength operation are very attractive for optical
interconnection and a number of optoelectronics applications.
New types of semiconductor lasers, such as multiple-micro-cavity
(MMC) lasers, deeply etched distributed-Bragg-reflector (DBR)
and vertical-grating distributed feedback (VG-DFB) lasers as
well as vertical-grating distributed-reflector (VG-DR) lasers
have been studied both theoretically and experimentally.
Membrane lasers consisting of very thin semiconductor core
layer sandwiched by polymer/SiO2
cladding layers have been also studied.
Results obtained in this research are as follows: |
| |
(1) High-reflectivity semiconductor/BCB reflectors were
fabricated by multiple sequential steps of CH4/H2
RIE etching and O2 plasma ashing.
The reflectivity was estimated to be as high as 95%. Using
these reflectors, highly uniform 1.55-µm-wavelength
lasers with low threshold and high differential quantum efficiency
were demonstrated. In addition, the reliability of such polymer-buried
DBR lasers was investigated for the first time. The technology
employed in this work is highly promising for the monolithic
integration and batch processing of edge emitting lasers with
other photonic devices through low-loss polymer waveguides.
(2) The novel design for obtaining single-mode operation by
combing a DBR facet with multiple cavities was analyzed in
theory and experiment. It was shown that the loss per groove
is an important parameter for the best choice of the cavity
number. Single-mode operation was obtained for different number
of cavities. Increasing the number of cavities will decrease
the efficiency drastically. The threshold current is lowest
for two or three cavities. Therefore, it can be concluded
that a CC laser is best for laser operation according to high
efficiency and low threshold. For the CC laser an SMSR of
36dB was achieved at 1.8 Ith.
(3) A novel DR laser including a vertically etched grating
was successfully fabricated. In case of a mesa width of Ws
= 6 µm and mesa width variation of Δ Ws
= 0.5 µm, a low threshold current of Ith
= 12.4 mA and a high differential quantum efficiency of
hd = 42% were achieved
with an SMSR of 33 dB.
(4) Distributed feedback lasers with a deeply etched first
order vertical grating were realized for the first time. It
was shown that we could obtain an effective coupling by reducing
the stripe width. The sample with the cavity length of 430
µm, 1.8 µm stripe width and 0.2 µm grating
depth on each lateral side exhibited a 12.5 mA threshold current,
37 % total differential quantum efficiency and an SMSR of
35 dB at a bias current of two times the threshold.
(5) By use of VG-DFB structure, it was clarified that structural
birefringence can be completely eliminated. The grating coupling
coefficient can also be polarization independent by adjusting
grating depth.
(6) Novel semiconductor laser structure, that is, membrane
laser which has the Benzocyclobutene (BCB) cladding layers,
enables to increase optical confinement into active layer
due to a large refractive index difference between the active
and cladding layers. A RT-CW operation of membrane DFB laser
consisting of deeply etched single-quantum-well wirelike active
regions was demonstrated for the first time under optical
pumping. A threshold power of 38 mW was obtained for 10.7
µm-wide and 40 mm-long device.
From spontaneous emission spectrum, a large stop-band width
of 65 nm and a low equivalent refractive index of 2.30, which
are peculiar to a thin membrane waveguide structure, were
observed.
(7) In order to realize single mode and low threshold operation
of 1.5 mm-wavelength GaInAsP/InP
membrane DFB laser, buried heterostructure (BH) was innovated
by slightly changing the fabrication process. A threshold
pump power of 4.8 mW and an SMSR of 39 dB were obtained for
a 142 nm-thick semiconductor membrane core layer with a cavity
length of 120 µm and a stripe width of 2 µm under
RT-CW optical pumping. The corresponding threshold for current
injection was roughly estimated to be 88 µA. |
| |
|