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Home > Laboratories > Oda Lab.
ODAInvestigation of nanostructure quantum effect devices for future ultra-high speed and low-power integrated systems


Oda Lab.
http://odalab.pe.titech.ac.jp/en/





Objective
The purpose of this study is to discover the successors of today’s VLSI technology. We investigate quantum effects in semiconductor nanostructures and superconducting thin films.

Research Field
Quantum-effect devices, Single-electron devices, Ballistic Transistors, Nanotechnology

Research Theme
1) Single electron devices based on plasma- derived silicon nano crystals
Single electron devices are promising for low-power electronics in future VLSI and portable computer application. We are developing silicon nanostructure devices by the self-organized formation of silicon quantum dots using plasma processes. The advanced electron beam lithography processes can achieve position control. Single-electron tunneling characteristics and memory effects have been observed in silicon nano devices at various temperatures. A new project Neo Silicon featuring interaction between quantum dots has been launched.

HRTEM image of nano crystalline silicon

Fig 1 : HRTEM image of nano crystalline silicon.

2) Silicon ballistic electron devices
Ballistic transport, electrons travel without scattering, occurs when device size is much smaller than the electron mean free path. We have observed clear quantized conductance, an indication of ballistic transport, from a vertical transistor with a wrap-around gate structure. We have also observed electron emission from nano crystalline silicon dots with high efficiency.

Single electron tunneling
Fig 2 : Single electron tunneling characteristics in a silicon quantum dot device.

3) Atomic layer MOCVD of oxide ultra thin films
Very high quality superconducting and dielectric onside ultra thin films are prepared by atomic layer MOCVD method developed in our laboratory.

Single electron memory characteristics Ballistic vertical transistors
Fig. 3 : Single electron memory characteristics. Fig. 4 : Ballistic vertical transistors.