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Ultra-high resolution quad-crystal
x-ray diffraction analysis system for the study of semiconductor crystals
and super lattices. |
| Electron beam lithography system
with a field emitter and high-resolution sample stage for fabrication
of 10nm-scale ultra-fine structures. (The property of the sub-mm fabrication
facility.) |
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Focused ion beam etching and deposition
system for fabrication of ultra-fine structures for novel semiconductor
devices and fiber probes for photonic STM. |
| Electron cyclotron resonance -
reactive ion beam etching system for the fabrication of quantum structures. |
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Fully automatic reactive ion etching
system for the fabrication of high-aspect ratio ultra-fine structures. |
| Nanocrystalline silicon fabrication
machine equipped with a plasma cell in which silane gas is decomposed
by VHF plasma. |
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