 Japanese |
| Top |
| Reserch |
| Member |
| Publications |
| Facilities |
| Access |
| Acknowledgements |
| Tokyo Institute of Technology |
| Quantum NanoElectronics Research Center |
| Research Laboratory of Ultra-High Speed Electronics |
| Dept. of Physical Electronics |
Apparatuses
- Electron beam exposure machines (JEOL JBX-6300UA ＆JBX-6300SJ)
- Metalorganic vapor phase epitaxial reactor（Nippon Sanso HR-3246）
- Reactive Ion Etcher (Samco International RIE-10NR x3，ICP-RIE x1)
- Plasma CVD (Samco InternationalPD-240 )
- Atomic layer deposition machine (Cambridge Nanotech Savannah)
- E-gun evaporators with load-lock chamber （Eiko-Engineering）
- Scanning Electron Microscope （Hitachi S-5000 & S-5200）
- Focused Ion Beam Machine (Hitachi FB-2000A with micro-sampling system）
- semiconductor parameter analyzer (HP-4142B, HP4155A, HP-4155B)
- Vector Network analyzer （Anristu MS4647A ）
- Low temperature prober (Nagase BCT-10)
Electron beam exposure machine |
Electron beam exposure machine |
Metalorganic vapor phase epitaxial reactor |
E-gun evaporators with load-lock chamber |
Scanning Electron Microscope |
Focused Ion Beam Machine |
Plasma CVD (Samco InternationalPD-240) |
RIE(Reactive Ion Etching) machine |